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Nanoindentation tests on diamond-machined silicon wafers
Summary
This precision manufacturing study used nanoindentation to examine how diamond-turning creates an amorphous surface layer on silicon wafers, finding this layer has different mechanical properties than pristine silicon. This is a semiconductor manufacturing study with no relevance to environmental microplastics.
Nanoindentation tests were performed on ultraprecision diamond-turned silicon wafers and the results were compared with those of pristine silicon wafers. Remarkable differences were found between the two kinds of test results in terms of load-displacement characteristics and indent topologies. The machining-induced amorphous layer was found to have significantly higher microplasticity and lower hardness than pristine silicon. When machining silicon in the ductile mode, we are in essence always machining amorphous silicon left behind by the preceding tool pass; thus, it is the amorphous phase that dominates the machining performance. This work indicated the feasibility of detecting the presence and the mechanical properties of the machining-induced amorphous layers by nanoindentation.
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