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Modified nano zero-valent iron reduce toxicity of polystyrene microplastics to ryegrass (Lolium Perenne L.)
Summary
Researchers found that modified nano zero-valent iron particles can reduce the harmful effects of polystyrene microplastics on ryegrass growth. The microplastics alone caused significant declines in shoot weight and root length, but adding sulfidated or cellulose-modified iron nanoparticles to the soil helped alleviate these toxic effects. The study suggests that engineered nanomaterials could serve as a potential remediation strategy for microplastic-contaminated soils.
Microplastics pollution in environments has become a major concern and it has been proven to have adverse impacts on plants, so there is an urgent to find approaches to alleviate the detrimental effects of microplastics. In our study, we investigated the influence of polystyrene microplastics (PSMPs) on the growth, photosynthesis, and oxidative defense system changes of ryegrass, as well as the behavior of MPs at roots. Then three types of nanomaterials were applied to alleviate the adverse impact of PSMPs on ryegrass, which were nano zero-valent iron (nZVI), carboxymethylcellulose-modified-nZVI (C-nZVI) and sulfidated nZVI (S-nZVI), respectively. Our results suggested that PSMPs had significant toxicity to ryegrass, leading to decrease of shoot weight, shoot length and root length. Three nanomaterials regained the weight of ryegrass to a varying extent and made more PSMPs aggregate near roots. In addition, C-nZVI and S-nZVI facilitated the entrance of PSMPs into the root and promoted the chlorophyll a and chlorophyll b contents in leaves. Analysis of antioxidant enzymes and malondialdehyde content indicated that ryegrass coped well with the internalization of PSMPs, and all three types of nZVI could alleviate PSMPs-stress in ryegrass. This study elaborates the toxicity of MPs on plants and provides a novel insight into the fixing of MPs by plants and nanomaterials in environments, which needs to be further explored in future research.