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Designed new modified poly (methyl methacrylate) structures to improve photo resistance
Summary
This research designs and synthesizes modified poly(methyl methacrylate) (PMMA) polymer structures tailored for environmental remediation applications such as pollutant adsorption or filtration. Chemical modifications to the standard PMMA backbone are used to enhance functional performance in environmental contexts. The new structures offer potential as low-cost, tunable materials for addressing water or soil contamination.
Synthesized and engineered novel modified poly (methyl methacrylate) to create diverse polymer derivatives aimed at improving its photo-stability. Aromatic Schiff base moieties were added to commercially available poly (methyl methacrylate) through a synthetic modification. To increase the possibility of preventing cross-linking by bifacial reactions, ethylene diamine was first added in excess to one side of the PMMA polymer. In the second stage, new Schiff base molecules were created by reacting 5-nitro salicylaldehyde with an amino group. The structures of the generated modified polymers were validated using a variety of techniques, such as FTIR and 1H NMR.These methods confirmed the materials' structures and modification percentages. Photo-stabilizers from synthetic chemicals reduce PMMA polymeric chain photodegradation. Photo-stabilizers from synthetic chemicals reduce PMMA polymeric chain photodegradation. Modified PMMA was tested as photo stabilizers using weight loss to observe functional group development during radiation exposure. Authorized tests showed that new modified Schiff base polymers outperform PMMA blank photo-stabilizers. Thus, after 300 hours of UV light exposure, modified PMMA films photodegrade less than unmodified PMMA. Because of their high conjugation mechanism, linked units may absorb UV light.