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Molecular Dynamics Simulation Investigation of Thermal Assistance Effects in Synchronous Thermally Assisted Scratching of Monocrystalline 4H-SiC

Journal of Materials Engineering and Performance 2026

Summary

This research is about manufacturing better computer chips, not human health directly, it's materials science, not medicine. Scientists used computer simulations to find that gently heating a hard, glass-like material (silicon carbide, used in electronics) while cutting it with tiny abrasive tools causes much less hidden damage than cutting it cold. This matters for making more durable, higher-quality electronics and semiconductors, like those in phones, electric vehicles, and solar panels, but it has no direct connection to microplastics or personal health.

4H-SiC is a typical difficult-to-machine semiconductor due to its high hardness and anisotropy. Conventional abrasive machining is limited by subsurface damage (SSD) and tool wear. Thermally assisted machining offers advantages, but achieving thermal-mechanical coupling remains experimentally challenging. This study established a molecular dynamics (MD) model featuring synchronized contact between the heating zone and abrasive grains—simulated along the [ $$\overline{1}2\overline{1}0$$ ] crystal direction. The surface thermal power densities (Ps) were varied to investigate damage evolution, chip-debris morphology, machining forces, sliding friction coefficient (μ), dislocations, and SSD depth. Compared with conventional abrasive machining, at a critical Ps of 12.0 × 1011 W/cm2, μ, weighted mean of von Mises stress ( $$\overline{\sigma }_{vm}$$ ), and SSD depth decrease by 49.0, 28.3, and 67.6%, respectively. Sufficient thermal softening results in a $$\overline{\sigma }_{vm}$$ reduction in the deformation zone, which promotes plastic flow and surface amorphization. Energy dissipation is confined to the near-surface region, suppressing SSD propagation. This study provides atomic-scale insights for optimizing thermally assisted parameters to minimize SSD.

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